Characterizing the composition, structure, and mechanical properties of magnetron sputtering physical vapor deposition TiN and TiSiN coatings

Ti(Si)N coatings were deposited on Si wafers via magnetron sputtering physical vapor deposition technique. Scanning electron microscopy and atomic force used to study the morphologies, grain size, thicknesses of different films. X-ray diffraction confirmed formation titanium nitride cubic phase. photoelectron spectroscopy (XPS) was silicon oxygen levels in films, high resolution XPS determine surface oxide ratios as well silicon–nitrogen environment. The hardness these films then determined with nanoindentation. It shown that size film density could be controlled by level ion bombardment eliminate coatings, which led harder suggested due miscibility Si, a ternary TiSiN solid solution formed. Stronger (200) orientation TiN B1-NaCl crystals associated increased coatings. This crystalline structure preserved after incorporating Si.